Nanexa has received approval for a Japanese patent covering a specific structure in the shell used in its PharmaShell platform, strengthening the company’s portfolio of intellectual property for long-acting injectables based on atomic layer deposition technology. The patent has been granted under number JP7733651B2 and will run until at least December 2039.

Applications from the same family have been filed in other key regions, including the US and Europe. In recent months, Nanexa has also submitted three further patent applications that cover improvements to its PharmaShell technology, which the company expects will add protection until 2046 if granted.

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